Venn Design Journal: Embedded Process Competition

Submission: July 27, 2021
Registration: July 27, 2021
Language: English
Location: Concept
Prizes: Please see details below
Type: Open


Venn Design Journal seeks works of research, creative speculation, interviews, papers, and the like to expose the untapped potential of the embedded relationship of design and technology and the potential within.  These can be realized or unrealized works of architecture, fine arts, fashion, media studies, philosophy and theory, engineering- there is no limit.

An embedded design process has a vast embodied potential exposing limitless bounds and unrealized profundity necessitating a shift in design thinking, pedagogy, theory, process, and practice.

At the core of this investigation, the Venn issue Embedded Process interrogates the process of design in demonstrating a new credo that is no longer rooted in a traditional lineage of design but one that must spawn its own distinct and purposeful identity. This identity arises from the rules of the tools of process- analog or digital- and can often become the design itself. In this, the performative process and resultant design are subsumed into a larger, complex, cultural network. Where traditional industrial processes create hierarchies through automation and manufacturing, the performative network forms a field condition through innovation and input- pulsating and multi-nodal- via harnessed technology and customization. Developing and delimiting intrinsic interconnectedness at once, there reaches a feedback loop, spawning idiomatic characteristics and redefining systems through reconception. With this, the synergy challenges and redefines traditional questions of design and aesthetics.

This inaugural issue- Embedded Process – starts the Venn conversation by seeking exciting and radical investigations that try to grasp at the questions of new order through process that interrogates the feedback loop of spatial complexity with technology. These conversations should muse about the future of design, the redefinition of tools for such an exploration, and how performative process fits into the larger techno-cultural sphere.

Submission Requirements

Submissions shall be in the form of visual essays with text of 1,500 words maximum including endnotes, images (cited as figures).  All citation is to be in Chicago-Style.  All images to be between 300-500 dpi at 5” x 7” size. Manuscripts to be in the English language.

Submitted work shall be well-supported and well-researched as evidenced through proper citation.  All submissions shall undergo a double-blind peer review by a minimum of three reviewers with relevant expertise.

All published content within the journal and the website shall remain the property of their author(s).  Through the act of submission, author(s) give Venn Design Journal permission to publish their work either online or in print- all such content without further permissions.  Venn Design Journal, in turn, agrees not to publish the work of the author(s) outside of VDJ’s online platform or in print (outside printed Venn journals) without the express written consent of the author(s).

Desired submissions are those that are applied research/ practice or theory- in essence, work that is more than merely speculative and presents a more immediate challenge to the establishment.


>>> Go to the competition’s website <<<